Ferroelectrics For Beyond Von Neumann Computing

The increasing amount of data being processed in today’s electronic devices for classification tasks in image and audio recognition, autonomous driving, smart sensors signal processing or machine learning, requires a transition from the conventional compute centric paradigm to a more data centric paradigm. In the classical von Neumann architecture, the data is transferred between computing and memory units via a bus system with limited bandwidth, giving rise to the well-known von Neumann bottleneck. In order to bridge the existing gap between memory and logic units, the concept of physical separation between computing and memory unit has to be repealed.

Ferroelectric Tunnel Junction (FTJ) devices can be applied as synaptic weighting elements in neuromorphic processors, and offer the possibility of massive parallelism (fig. 1). These architectures use artificial neurons and synapses to emulate biological primitives underlying learning. In particular, the synapses act as both storage and computing element. Indeed, their role is to facilitate or inhibit the connection between neurons by changing their weight. In case of FTJs devices, the change of weight is mapped into a change of the device conductance.

Fig. 1:. A differential synaptic cell based on a 2T1C architecture can be expanded to integrate many capacitors on a single branch. This allows a parallel readout which greatly reduces read energy, and opens up possibilities for hyper dimensional computing and logic applications using FTJs or ferroelectric capacitors.

In order to use FTJ devices for applications in beyond-von Neumann computing, their properties should be further improved, for example increasing the tunneling current and the tunneling electroresistance ratio. BEOL-compatible processes can be developed to modify device behavior, such as work function engineering of the electrodes for increasing tunneling currents (fig. 2). Additionally, the device operation should be optimized to target specific functionalities and weight update schemes, which requires understanding of the device behaviour.  

Fig. 2: The tunnelling current densities of bilayer HZO/Al2O3 can be increased significantly via work function engineering of the electrodes (reducing WF with TiAlN) and reducing tunnel barrier thickness to 1 nm. This leads to 100x improvement compared to the original devices.

Novel devices based on spin-orbit interactions offer an alternative route to non-volatile memory devices. Skyrmions in magnetic bilayers can be used for memory-in-logic, with the benefit that they are topologically protected and highly robust. The integration of ferroelectric thin films with magnetic bilayers and device stacks designed for spin-orbitronics (fig. 3) enables investigation into a new generation of highly efficient, low-power, non-volatile components for beyond-von Neumann computing. The eventual target is to enable electric field control of magnetic spin textures.

Fig. 3: Ferroelectric hafnia was integrated on graphene using an oxidized Ta interlayer. The thickness of the interlayer could be optimized to increase 2Pr up to 28 µC/cm2 without decreasing the magnetic anisotropy of an underlying magnetic bilayer.

Contact

Dr. Stefan Slesazeck
Senior Scientist
Phone: +49 3512124990-00
E-Mail: info@namlab.com


Cooperation:
X-FAB, IBM, IMDEA Nanociencia, CEA-Leti, CSIC, FAU, IUNET, Universities of Udine, Modena, Groningen, Zürich, HZB, NCSRD, ETH Zurich, AMAT, Melexis.