NaMLab invites to the Novel High-k Application Workshop on March 12th and 13th, 2025. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities.
In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO2 and ZrO2 and the application of these films will be discussed.
Workshop Registration: please use the following Eventfrog link.
Registration fee: 55 €/workshop day includes all meals and coffee breaks.
In addition, we will have a conference dinner buffet in the Occidental Hotel on March 12th at 7:30pm.
Event Location: IFW Dresden, Helmholtzstrasse 20, directions
A limited number of parking spaces are available at Namlab – Noethnitzer Strasse 64. Please mention the workshop at the barrier.
Closest accommodations:
1) Occidental Dresden Newa Hotel (formerly Pullman Hotel)
2) IBIS
Agenda
Sponsor:
