NaMLab invites to the Novel High-k Application Workshop on March 12th and 13th, 2025. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities.
In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO2 and ZrO2 and the application of these films will be discussed.
Registration will start end of January.
Event Location: IFW Dresden, Helmholtzstrasse 20, directions
Parking at IFW – please mention ‚Namlab workshop‘
Closest accommodations:
1) Occidental Dresden Newa Hotel (formerly Pullman Hotel)
2) IBIS
List of speakers
Sponsor:
